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Upcoming Inductively Coupled Plasma Webinars

Stay ahead in elemental analysis with expert webinars on ICP‑MS, analytical chemistry workflows, and chemical analysis applications for trace metals, speciation, and regulatory compliance.

January 6th at 3:30 pm (EST)

Elemental Analysis of Alloy Samples on an Agilent ICP-OES

Discover how Agilent ICP‑OES enables precise alloy analysis by overcoming spectral interferences and ensuring a wide linear dynamic range. This webinar explores how varying elemental composition controls mechanical properties, helping industries achieve reliable performance through accurate analytical chemistry and chemical analysis workflows.

January 13th at 3:30 pm (EST)

The Importance of Controlling Contamination and Choosing the Right Sample Introduction System Even Before You Start Your Analysis to Achieve the Best Detection Limits

Achieving ultra‑low detection limits in today’s semiconductor industry starts with proper contamination control and sample introduction. This webinar explores strategies to minimize environmental contamination and select the right ICP‑MS sample introduction system, ensuring accurate, reliable results for advanced semiconductor applications.

January 22nd at 2:00 pm (EST)

Tips and Tricks Workshop on ICP-OES: Smarter Method Development

Achieving the best sensitivity and lowest detection limits in ICP‑OES requires precise tuning and smart strategies. This Agilent webinar explores practical techniques to optimize instrument performance, overcome spectral interferences, and enhance analytical accuracy—helping you push the boundaries of elemental analysis in demanding applications.

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